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Electrical properties and local domain structure of LiNbO3 thin film grown by ion beam sputtering method

机译:离子束溅射法制备LiNbO3薄膜的电性能和局部畴结构

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摘要

The nanocrystalline ferroelectric LiNbO3 films on (001) Si substrates with the random orientation of polycrystalline grains and the predominance of the grains with lateral orientation of the polar axis were grown using the ion beam sputtering method. The remanent polarization and the coercive field are 12 μC/cm2 and 29 kV/cm, respectively. The thermal annealing leads to the coarsening of the grains. The appearance of the "local texture," which gives rise to the unipolarity of the heterostructures caused by the predominance of the one direction in the vertical component of the spontaneous polarization, is investigated. © The Chinese Society for Metals and Springer-Verlag Berlin Heidelberg.
机译:使用离子束溅射方法在(001)Si衬底上生长了具有多晶晶粒的无规取向和占优势的,具有极轴横向取向的晶粒的纳米晶铁电LiNbO3薄膜。剩余极化和矫顽场分别为12μC/ cm2和29 kV / cm。热退火导致晶粒粗化。研究了“局部纹理”的出现,该局部纹理引起了由自发极化的垂直分量中的一个方向的优势引起的异质结构的单极性。 ©中国金属学会和施普林格出版社柏林海德堡。

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